Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films
نویسندگان
چکیده
منابع مشابه
Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films
State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer opportunities to fabricate compound semiconductors at lower temperatures and lower capital costs. A...
متن کاملIon Beam Assisted Deposition of Thin Epitaxial GaN Films
The assistance of thin film deposition with low-energy ion bombardment influences their final properties significantly. Especially, the application of so-called hyperthermal ions (energy <100 eV) is capable to modify the characteristics of the growing film without generating a large number of irradiation induced defects. The nitrogen ion beam assisted molecular beam epitaxy (ion energy <25 eV) ...
متن کاملMicrowave-assisted Low-temperature Growth of Thin Films in Solution
Thin films find a variety of technological applications. Assembling thin films from atoms in the liquid phase is intrinsically a non-equilibrium phenomenon, controlled by the competition between thermodynamics and kinetics. We demonstrate here that microwave energy can assist in assembling atoms into thin films directly on a substrate at significantly lower temperatures than conventional proces...
متن کاملSimulation of Fabrication toward High Quality Thin Films for Robotic Applications by Ionized Cluster Beam Deposition
The most commonly used method for the production of thin films is based on deposition of atoms or molecules onto a solid surface. One of the suitable method is to produce high quality metallic, semiconductor and organic thin film is Ionized cluster beam deposition (ICBD), which are used in electronic, robotic, optical, optoelectronic devices. Many important factors such as cluster size, cluster...
متن کاملSurfactant-Assisted Electrodeposition of CoFe-Barium Hexaferrite Nanocomposite Thin Films
The influences of anionic sodium dodecylsulfate (SDS) and cationic Hexadecyltrimethylammonium bromide (HTAB) surfactants on the incorporation and distribution of barium hexaferrite nanoparticles in the electrodeposited CoFe-BaFe12O19 composite thin films were studied. Sulphate bathes with natural pH containing 0 to 2 g/L surfactants were used for electroplating at room temperature. Field emissi...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Processes
سال: 2014
ISSN: 2227-9717
DOI: 10.3390/pr2020441